| 主要规格及技术指标 |
1.极限真空度优于2×10-6mbar。
2.离子溅射电流：15-150mA，连续可调，溅射时间：1-1800s
3.镀膜厚度：1-1000nm可调，自动终止，检测精度0.1nm
4.溅射用工作气体：氩气
5.方形金属样品仓，尺寸宽：200mm，深：150mm，高：195mm
6.样品台直径100mm，带24孔，可插入24个SEM标准样品台
7.内置式彩色触摸屏控制，全自动控制
1. The ultimate vacuum is better than 2×10-6mbar.
2. Sputtering current: 15-150mA, continuously adjustable；Sputtering time: 1-1800s
3. Coating thickness: 1-1000nm， adjustable, automatic termination, detection accuracy 0.1nm
4. Working gas for sputtering: Ar
5.Square metal sample chamber size： width: 200mm, depth: 150mm, height: 195mm
6.The diameter of the sample stage is 100mm, with 24 holes, 24 SEM standard sample stages can be inserted
7. Built-in color touch screen control, automatic control |
