Basic information
High-throughput laser molecular beam epitaxy (Pascal, PAC-LMBE) located in Room 104, Building 4.
Specifications and technical indicators
1) Maximum temperature is 1100℃, with accuracy ±1℃；
2) Maximum sample size is 10*10mm;
3) Motor-drived linear mask system with precision <100um;
4) RHEED with 2-stage differential pump, working pressure of 20Pa;
5) Six 1-inch targets(revolution + rotation);
6) Automatic control system of evaporation and mask.
Functions
PLD technology has great advantages. Researchers have been exploring the types of thin film materials PLD can deposit.
Now, PLD can prepare almost all kinds of film materials.
At present, the research on thin film materials mainly focuses on the following aspects:
1) Superconducting film;
2) Diamond and diamond-like carbon films;
3) Giant magnetoresistance film;
4) Ferroelectric, piezoelectric and photoelectric films;
Services
1) PLD technical training. Growth of SrTiO3/STO film with more than 10 oscillations observed by RHEED;
2) Preparation of conventional films;
3) Development of growth process for special materials.
